Struct libreda_lefdef::lef_ast::TechnologyLef

pub struct TechnologyLef {
    pub units: Units,
    pub manufacturing_grid: Option<f64>,
    pub use_min_spacing: Option<()>,
    pub clearance_measure: ClearanceMeasure,
    pub property_definitions: BTreeMap<String, ()>,
    pub fixed_mask: bool,
    pub layers: Vec<Layer>,
    pub max_via_stack: Option<(u64, Option<(String, String)>)>,
    pub via_rules_generate: BTreeMap<String, ()>,
    pub non_default_rule: (),
}

Technology LEF containing technology information.

Fields

units: Units

Units used in this library.

manufacturing_grid: Option<f64>

Grid for geometrical alignment. Cells and shapes snap to locations on this grid.

use_min_spacing: Option<()>

clearance_measure: ClearanceMeasure

Type of distance measure (Euclidean: dx^2 + dy^2, MaxXY: max(dx, dy))

property_definitions: BTreeMap<String, ()>

Definitions of custom properties.

fixed_mask: bool

Disable shifting of masks. When set, shifting of macro pin mask assignments to other masks is not allowed. Used for technologies that use multi-mask patterning.

layers: Vec<Layer>

Layer definitions (masterslice, cut, routing, …). Layers are defined in their process order from bottom to top.

max_via_stack: Option<(u64, Option<(String, String)>)>

Maximum number of single-cut vias stacked on top of each other. Optionally defines a range of (bottom layer, top layer) where the rule applies. Otherwise the rule applies to all layers.

via_rules_generate: BTreeMap<String, ()>

VIA GENERATE rules by name.

non_default_rule: ()

NONDEFAULTRULEs by name.

Trait Implementations

impl Clone for TechnologyLef

fn clone(&self) -> TechnologyLef

Returns a copy of the value.

fn clone_from(&mut self, source: &Self)

Performs copy-assignment from source.

impl Debug for TechnologyLef

fn fmt(&self, f: &mut Formatter<'_>) -> Result

Formats the value using the given formatter.

impl Default for TechnologyLef

fn default() -> TechnologyLef

Returns the “default value” for a type.